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800nm high dispersion ultrafast reflector
800nm high dispersion ultrafast reflector
Product details
800nm high dispersion ultrafast reflector
Reflectance at 780-830nm>99.8% (P-polarized)
The group delay dispersion under 5 ° AOI is -1300fs2
Pulse compression for Ti: sapphire ultrafast lasers
Ultra fast chirping coating
The 800nm high dispersion ultrafast reflector has an optimized multilayer coating based on dispersion interference,Has low group latencyThe characteristics of dispersion (GDD) and high reflectivity. At a design angle of incidence (AOI) of 5 °, the GDD of these mirrors is -1300 fs2And the low reflectivity of P-polarization is 99.8% The high dispersion design of these ultrafast mirrors can be controlledThird order and higher orderDispersion and provide high beam stability. The 800nm high dispersion ultrafast mirror is suitable for pulse compression and dispersion compensation of ultrafast pulses such as Ti: sapphire lasers. Standard inch size, fused silica substrate, with 10-5 surface quality and λ/10 surface flatness.
General specifications
Design wavelength DWL (nm): |
800 |
Incident angle (°): |
5 |
Wavelength range (nm): |
780 - 830 |
Reflection during DWL (%): |
>99.9% (typical, p-polarization) |
Thickness (mm): |
6.35 ±0.2 |
Coating type: |
Dielectric |
basal: |
Fused Silica |
Coating specifications: |
Ravg>99.8%, GDD = -1300 fs2@ 780 - 830nm (p-polarization) Rabs>99.9% @ 800nm (typical, p-polarization) |
GDD Specification: |
-1300fs2@ 780 - 830nm
|
Effective aperture (%): |
80 |
Rear surface: |
Commercial Polish |
Coating: |
Ultrafast (780-830nm) |
Surface quality: |
10-5 |
Wedge (arcmin): |
10 ±5 |
Irregularity (P-V) @632.8nm: |
λ/10 |
Minimum Reflectivity : |
>99.8% @780 - 830nm (p-polarization) |
PRODUCT INFORMATION
Dia. (mm) |
product code |
12.70 |
#12-330 |
25.40 |
#12-331 |
Technical data:
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