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Suzhou Industrial Park Huiguang Technology Co., Ltd
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AWL series wafer inspection system
The AWL series wafer inspection system combines stability and safety, and can safely and reliably transport wafers, making it suitable for wafer inspe
Product details

AWL 系列晶圆检查系统

AWL 系列晶圆检查系统的显微镜


At present, the AWL series wafer handlers have two models, AWL046 and AWL068, which can be used for 4/6-inch wafer inspection and 6/8-inch wafer inspection respectively. They have a wide range of adaptability and flexible matching, with freely adjustable inspection modes that fully comply with ergonomic design, and are comfortable and easy to operate.

AWL seriesAdvantages of wafer inspection system

360 ° macroscopic examination

360°宏观检查

The AWL series wafer inspection system has a macroscopic inspection arm that can achieve 360 ° rotation for macroscopic inspection of the crystal surface and back, making it easier to detect scratches and dust. The wafer can be tilted and observed freely through the operating lever. The tilt angle of the crystal surface is ≤ 70 °, the tilt angle of crystal back 1 is ≤ 90 °, and the tilt angle of crystal back 2 is ≤ 160 °. By using the rotation function and tilt angle, the entire front, back, and edges of the wafer can be visually inspected.

● Ergonomic design

晶圆检查系统的LCD显示屏

The LCD display screen of the wafer inspection system can provide operators with a more intuitive visual experience, displaying the current inspection items and sequence clearly, and debugging parameters at a glance.

The manual quick release of the vacuum stage in the wafer inspection system can improve the comfort and work efficiency of the operator.

Application case of wafer defect inspection

晶圆缺陷检查

晶圆缺陷检查

AWL seriesTechnical specifications for wafer inspection system

model

AWL046

AWL068

Wafer size (SEMI specification)

150mm/125mm/100mm

200mm/150mm

Minimum thickness of wafer

150μm

180μm

type

Open Box (SEMI Stad.25 (26) - lot)

Number of film boxes

1 Port

Check mode settings

Full inspection/odd inspection/even inspection/manual selection

Scanning of wafers inside the wafer box

Wafer pre positioning

Wafer positioning

Non contact positioning flat edge/V-shaped groove, supporting 0 °, 90 °, 180 °, 270 ° orientation settings

Check function

Microscopic examination

Macroscopic inspection of crystal surface

Macroscopic examination of crystal back 1

Macroscopic examination of crystal back 2

Adapting microscope

SOPTOPmetallurgical microscopeMX68R

stage

6-inch four layer mechanical mobile platform, low hand position X and Y direction coaxial adjustment; Wafer carrier table, capable of 360 ° rotation; Travel distance 228mm (X direction) × 170mm (Y direction) Observation range:
170mmX170mm ; Equipped with a clutch handle, it can be used for rapid movement within the full range of travel;

8-inch four layer mechanical mobile platform, with coaxial adjustment in the X and Y directions at low hand positions; Wafer wafer stage, capable of 360 ° rotation, with a movement range of 280mm (X direction) × 210mm (Y direction). Observation range:
210mm×210mm ; Equipped with a clutch handle, it can be used for rapid movement within the full range of travel;

power supply

1P/220V/16A

vacuum source

—70KPA

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