

At present, the AWL series wafer handlers have two models, AWL046 and AWL068, which can be used for 4/6-inch wafer inspection and 6/8-inch wafer inspection respectively. They have a wide range of adaptability and flexible matching, with freely adjustable inspection modes that fully comply with ergonomic design, and are comfortable and easy to operate.
AWL seriesAdvantages of wafer inspection system
360 ° macroscopic examination

The AWL series wafer inspection system has a macroscopic inspection arm that can achieve 360 ° rotation for macroscopic inspection of the crystal surface and back, making it easier to detect scratches and dust. The wafer can be tilted and observed freely through the operating lever. The tilt angle of the crystal surface is ≤ 70 °, the tilt angle of crystal back 1 is ≤ 90 °, and the tilt angle of crystal back 2 is ≤ 160 °. By using the rotation function and tilt angle, the entire front, back, and edges of the wafer can be visually inspected.
● Ergonomic design

The LCD display screen of the wafer inspection system can provide operators with a more intuitive visual experience, displaying the current inspection items and sequence clearly, and debugging parameters at a glance.
The manual quick release of the vacuum stage in the wafer inspection system can improve the comfort and work efficiency of the operator.
Application case of wafer defect inspection


AWL seriesTechnical specifications for wafer inspection system
model |
AWL046 |
AWL068 |
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Wafer size (SEMI specification) |
150mm/125mm/100mm |
200mm/150mm |
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Minimum thickness of wafer |
150μm |
180μm |
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type |
Open Box (SEMI Stad.25 (26) - lot) |
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Number of film boxes |
1 Port |
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Check mode settings |
Full inspection/odd inspection/even inspection/manual selection |
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Scanning of wafers inside the wafer box |
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Wafer pre positioning |
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Wafer positioning |
Non contact positioning flat edge/V-shaped groove, supporting 0 °, 90 °, 180 °, 270 ° orientation settings |
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Check function |
Microscopic examination |
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Macroscopic inspection of crystal surface |
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Macroscopic examination of crystal back 1 |
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Macroscopic examination of crystal back 2 |
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Adapting microscope |
SOPTOPmetallurgical microscopeMX68R |
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stage |
6-inch four layer mechanical mobile platform, low hand position X and Y direction coaxial adjustment; Wafer carrier table, capable of 360 ° rotation; Travel distance 228mm (X direction) × 170mm (Y direction) Observation range: |
8-inch four layer mechanical mobile platform, with coaxial adjustment in the X and Y directions at low hand positions; Wafer wafer stage, capable of 360 ° rotation, with a movement range of 280mm (X direction) × 210mm (Y direction). Observation range: |
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power supply |
1P/220V/16A |
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vacuum source |
—70KPA |
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