PfeifferApplication of Molecular Pump in LOW-E (Low Radiation Glass) Production Line
LOW-E, full name Low emissivity, is a low emissivity coated glass. Compared to heat reflective glass, it is a new type of energy-saving glass. Currently, vacuum magnetron sputtering coating technology (offline method) is widely used internationally to produce Low-E glass. Pfeiffer, a German Pfeiffer, sold by Bodong Companymolecular pumpSuccessfully applied to this.

principleThe glass is vertically placed on a rack and placed in a vacuum environment on the order of 10-1 Pa. An appropriate amount of process gas (inert gas Ar or reactive gas O2, N2) is introduced while maintaining a stable vacuum degree. Embedding target materials such as Ag and Si into the cathode, and applying a magnetic field in a horizontal direction perpendicular to the cathode to form a magnetron target. Using a magnetron target as the cathode and a DC or AC power source, under the action of high voltage, the process gas ionizes and forms plasma. Among them, electrons undergo high-speed spiral motion under the combined action of electric and magnetic fields, collide with gas molecules, and produce more positive ions and electrons; Under the action of an electric field, positive ions reach a certain energy and collide with the cathode target material. The sputtered target material deposits on the glass substrate to form a thin film. In order to form a uniform and consistent film layer, the cathode target moves back and forth near the glass surface. In order to obtain multilayer films, multiple cathodes must be used, each of which moves back and forth on the glass surface to form a certain film thickness.

PFEIFFER from Germany has won the favor of LOW-E market customers with its over 120 years of vacuum manufacturing experience and global after-sales service and technical support VON ARDENNE is the most typical customer. PFEIFFERmolecular pumpThe LOE-E production line is used by Chinese glass manufacturing giants such as Xinyi Glass and South Glass.
Pfeiffermolecular pumpadvantage:

• Multiple pumping speeds for customers to choose from, with pumping speeds ranging from 1000 to 2000L/S
• For H₂, He and Ar, CF₄Has high pumping speed
• Installation position from 0 to 90 degrees, 90 to 180 degrees
• High gas flow rate, even for Ar and CF₄
• The integrated TC 1200 driver unit can be directly connected to the power supply
• Corrosion resistance is available for selection
• Rich interface: RS-485 and remote control; Profibus or Devicenet are available for selection
• Having IP 54 and Semi S2 rating
• Stable and safe rotor bearing system
• Compliant with UL, CSA, and TUV certifications
• Simple installation